Novel method to determine contact resistivity and sheet resistance under the contact

Authors
Thoang, DD Kovacs, B Mojzes, I
Citation
Dd. Thoang et al., Novel method to determine contact resistivity and sheet resistance under the contact, INT J ELECT, 86(3), 1999, pp. 281-286
Citations number
12
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
INTERNATIONAL JOURNAL OF ELECTRONICS
ISSN journal
00207217 → ACNP
Volume
86
Issue
3
Year of publication
1999
Pages
281 - 286
Database
ISI
SICI code
0020-7217(199903)86:3<281:NMTDCR>2.0.ZU;2-H
Abstract
A method to determine specific contact resistance and sheet resistivity und er the contact using two L-type cross Kelvin resistors is presented. In the model analysed in the present paper, the sheet resistivity under the conta ct was different from the resistance of the layer outside the contact. This difference is caused by metallurgical reactions taking place during the he at treatment of the metallized wafer.