X-ray diffraction study of concentration depth profiles of binary alloy coatings during thermal diffusion: application to brass coating

Citation
B. Bolle et al., X-ray diffraction study of concentration depth profiles of binary alloy coatings during thermal diffusion: application to brass coating, J APPL CRYS, 32, 1999, pp. 27-35
Citations number
19
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF APPLIED CRYSTALLOGRAPHY
ISSN journal
00218898 → ACNP
Volume
32
Year of publication
1999
Part
1
Pages
27 - 35
Database
ISI
SICI code
0021-8898(19990201)32:<27:XDSOCD>2.0.ZU;2-4
Abstract
Using the Houska method based on X-ray diffraction-line profile analysis, n ew mathematical treatments are proposed to compute directly the concentrati on depth profile of thin films obtained by diffusion. As an example, concen tration depth profiles of a brass layer have been studied during the therma l diffusion process. This nondestructive method is fast (a few minutes) and allows the sample to be used for complementary analysis if necessary.