Dewetting of thin block copolymer films

Citation
Iw. Hamley et al., Dewetting of thin block copolymer films, J COLL I SC, 209(1), 1999, pp. 255-260
Citations number
24
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF COLLOID AND INTERFACE SCIENCE
ISSN journal
00219797 → ACNP
Volume
209
Issue
1
Year of publication
1999
Pages
255 - 260
Database
ISI
SICI code
0021-9797(19990101)209:1<255:DOTBCF>2.0.ZU;2-8
Abstract
The dewetting of thin films of low molecular weight diblock and triblock co polymers of poly(oxyethylene)/poly(oxybutylene) on silicon has been studied using video microscopy and X-ray reflectivity. Dewetted films were observe d to comprise polygonal domains of polymer droplets, with a domain size of several millimeters. The dewetted films were studied using Xray reflectivit y, which showed that a film of polymer <50 Angstrom thick remains on the su bstrate at the same time as the macroscopic droplets. This suggests that au tophobic dewetting occurred in this system; i.e., a microscopically thin fi lm was in equilibrium with macroscopic droplets. The growth velocity of hol es in the polymer film was found to be constant at a fixed temperature in t he stage of hole growth that could be studied using optical microscopy. The velocity was found to be an exponential function of temperature, (C) 1999 Academic Press.