Effects of pressure on PbTiO3 thin film prepared by low-pressure thermal plasma deposition

PbTiO3 thin films were prepared by low-pressure thermal plasma deposition m ethod on (100)MgO substrates. The mists of the mixed solution of each metal alkoxides and 2-methoxyethanol were introduced into a plasma flame and dep osited onto substrates. The constituent phases, the crystal texture and the surface morphology were drastically changed by the chamber pressure. Over 13332 Pa, single phase PbTiO3 films were obtained. They were grown epitaxia lly and their surface morphology was composed of rectangular shaped grains. The remnant polarization and coercive field of the film from the hysteresi s loop were about 0.10 C . m(-2) and 5.12 MV . m(-1), respectively.