We present some test results of microstrip gas chambers with bore-silicate
glass substrates, which were coated before the photolithographic processing
. We compare various coatings: sputtered S8900 glass and three coatings mad
e by industrial companies (SURMET, VITO and ICMC). The composition and elec
trical properties of the different materials are discussed. Gain, current a
nd rate capability are compared with those obtained from identical uncoated
glass substrates. (C) 1999 Elsevier Science B.V. All rights reserved.