High resolution imaging for charged particles using CR-39 and atomic forcemicroscopy

Recently Atomic Force Microscopy (AFM) has been used for a readout of Solid State Nuclear Track Detectors (SSNTD). In this technique, the SSNTD is etc hed for very short time and scanned by an AFM to observe track etch pits. E tch pits of several hundred nm in diameter can be observed. We applied this technique to charged particle imaging using CR-39. CR-39 plates were etche d for about 5 min in 27% NaOH solution at 70 degrees C. Then very small etc h pits were measured. A typical diameter of etch pits was below 1 mu m and a typical etch pit depth was about several hundred nm. The obtained image h as demonstrated a position resolution of less than 100 nm. Ion microbeam pr ofiles were also measured by the system. (C) 1999 Elsevier Science B.V. All rights reserved.