Study of an ECR sputtering plasma source

The characteristics of a sputtering plasma source using electron cyclotron resonance, operating on the ERIC facility dedicated to isotope separation b y the plasma process, are described. A simple model based upon the particle conservation equation allows us to derive the ionization probability and t he reflux fraction that govern the source operating conditions, both with a nd without carrier gas. Other data such as sputtering yields of Ar+ and Kr ions on Ni, Cu, Pd and Gd targets as well as their self-sputtering yields have been also determined for the first time in the case of gadolinium. The axial deposit profile of metal atoms on the lateral screen of the source i s in accordance with the Yamamura semi-empirical differential sputtering yi eld, and the ionization coefficient of GdI is deduced.