Testing a furfuryl alcohol resin as a negative photoresist

Poly(furfuryl alcohol) was prepared using methylene dichloride as solvent a nd trifluoroacetic acid as catalyst. Synthesis was monitored in order to ac hieve a desirable structure capable of crosslinking under the action of lig ht. The resulting product was a soluble dark brown resin that gave remarkab le photocrosslinking performance as a negative photoresist when exposed to ultraviolet light, giving photolithographic patterns with a resolution of a bout 5 mu m. (C) 1999 Elsevier Science Ltd. All rights reserved.