Deep level centers in silicon carbide: A review

Authors
Citation
Aa. Lebedev, Deep level centers in silicon carbide: A review, SEMICONDUCT, 33(2), 1999, pp. 107-130
Citations number
204
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SEMICONDUCTORS
ISSN journal
10637826 → ACNP
Volume
33
Issue
2
Year of publication
1999
Pages
107 - 130
Database
ISI
SICI code
1063-7826(199902)33:2<107:DLCISC>2.0.ZU;2-6
Abstract
Results from current studies of the parameters of deep centers in 6H-, 4H-, and 3C- SiC are analyzed. Data are presented on the ionization energy and capture cross sections of centers formed by doping SiC with different types of impurities or during irradiation, as well as of intrinsic defects. The involvement of these centers in radiative and nonradiative recombination is examined. This analysis of published data illustrates the large effect of intrinsic defects in the SiC crystal lattice both on the formation of deep centers and on the properties of the epitaxial layers themselves, such as t heir doping level and polytype homogeneity. (C) 1999 American Institute of Physics. [S1063-7826(99)00102-7].