Thermodynamic analysis for chemical vapor deposition diamond with the participation of chlorine

Authors
Liu, ZJ Zhang, W Zhang, JY Wan, YZ Wang, JT Cao, CB Zhu, HS
Citation
Zj. Liu et al., Thermodynamic analysis for chemical vapor deposition diamond with the participation of chlorine, CHEM J CH U, 20(1), 1999, pp. 111-114
Citations number
14
Categorie Soggetti
Chemistry
Journal title
CHEMICAL JOURNAL OF CHINESE UNIVERSITIES-CHINESE
ISSN journal
02510790 → ACNP
Volume
20
Issue
1
Year of publication
1999
Pages
111 - 114
Database
ISI
SICI code
0251-0790(199901)20:1<111:TAFCVD>2.0.ZU;2-H
Abstract
Diamond growth condition for C-H-CI system is studied by using the non-equi librium thermodynamic coupling model. The phase diagram for diamond growth is calculated, which is in good agreement with many reported experiments, T he experimental observation that diamond film may grow at a higher rate und er low temperature and have better qualities due to the addition of chlorin e is also discussed according to the thermodynamic analysis.