Electron field emission from filtered arc deposited diamond-like carbon films using Au and Ti layers

In this work, tetrahedral diamond-like carbon (DLC) films are deposited on Si, Ti/Si and Au/Si substrates by a new plasma deposition technique - filte red are deposition (FAD). Their electron field emission characteristics and fluorescent displays are tested using a diode structure. It is shown that the substrate can markedly influence the emission behavior of DLC films. An emission current of 0.1 mu A is detected at electric field E-DLC/Si = 5.6 V/mu m, E-DLC/Au/Si = 14.3 V/mu M, and E-DLC/Ti/Si = 5.2 V/mu m, respective ly. At 14.3 V/mu m, an emission current density J(DLC/Si) = 15.2 mu A/cm(2) , J(DLC/Au/Si) = 0.4 mu A/cm(2), and J(DLC/Ti/Si) = 175 mu A/cm(2) is achie ved, respectively. It is believed that a thin TiC transition layer exists i n the interface between the DLC film and Ti/Si substrate. (C) 1999 Elsevier Science S.A. All rights reserved.