Bm. Kostishko et al., Effect of electron irradiation on the electronic structure and photoluminescence behavior of porous silicon, INORG MATER, 35(3), 1999, pp. 213-217
The effect of electron irradiation on the electronic structure, surface com
position, and photoluminescence behavior of porous n-type Si was studied. T
he density of states in the valence band determined as a function of irradi
ation dose by Auger electron spectroscopy indicates that 4-keV electron irr
adiation leads to decomposition and rapid desorption of the hydrogen-contai
ning species present on the quantum-wire surface. As the irradiation dose r
ises, radiation-induced defects gradually accumulate, and the amorphous con
tent of porous Si increases. Irradiation of porous Si at temperatures from
20 to 125 degrees C allowed us to determine the apparent activation energy
of irradiation-induced photoluminescence quenching, Delta E = 0.13 eV. It i
s shown that the photoluminescence quenching is mainly due to the formation
of nonradiative-recombination centers during hydrogen desorption. A model
for the outdiffusion of desorption products from porous Si is presented, an
d the hydrogen diffusivity in porous Si is estimated.