The corrosion potential and morphology of copper films deposited from a cya
nide solution on zinc diecast were studied in acid solutions similar to tho
se employed in industry for the deposition of a second copper layer. Open c
ircuit potential measurements and gravimetric methods were employed to dete
rmine the influence of the copper electrodeposition variables on the corros
ion potential. The influence of variables such as the presence or absence o
f additives, the current density and the copper or cyanide concentrations w
ere studied. The corrosion potential decreased with increasing copper film
thickness. Less protection was obtained when a thin copper layer was electr
odeposited from a solution without additives. Higher protection for the sam
e thickness was obtained from a solution with high cyanide content. This re
sult is related to the strong interaction between cyanides and the metal su
rface during the electrodeposition. A smooth surface structure was observed
by SEM under these conditions.