Effect of helium partial pressure on DC-magnetron sputtering of Co-Cr films

Citation
H. Jia et al., Effect of helium partial pressure on DC-magnetron sputtering of Co-Cr films, J MAGN MAGN, 193(1-3), 1999, pp. 124-127
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
ISSN journal
03048853 → ACNP
Volume
193
Issue
1-3
Year of publication
1999
Pages
124 - 127
Database
ISI
SICI code
0304-8853(199903)193:1-3<124:EOHPPO>2.0.ZU;2-F
Abstract
The effect of diluting the argon sputter gas with helium in DC-magnetron sp uttering of both CoCr magnetic layers and Cr underlayers was studied. A Co8 8Cr12 target and a PET substrate were used. The addition of helium markedly improved the longitudinal magnetic properties and the magnetic uniformity of the films. It is shown that sputtering of the Cr underlayer with a He/Ar mixture improved the magnetic properties of the CoCr film which was sputte red subsequently; an explanation is that the structure of the Cr him sputte red with He/Ar is better suited to the epitaxial growth of CoCr. The benefi cial effects of He are ascribed to an increased ion bombardment on the subs trate. This is supported by measurement of the ion current of the substrate and by SEM measurements. (C) 1999 Elsevier Science B.V. All rights reserve d.