R. Yonemasu et al., CHARACTERIZATION OF THE ALTERNATIVE EXCISION-REPAIR PATHWAY OF UV-DAMAGED DNA IN SCHIZOSACCHAROMYCES-POMBE, Nucleic acids research, 25(8), 1997, pp. 1553-1558
Schizosaccharomyces pombe cells deficient in nucleotide excision repai
r (NER) are still able to remove photoproducts from cellular DNA, show
ing that there is a second pathway for repair of UV damage in this org
anism. We have characterized this repair pathway by cloning and disrup
tion of the genomic gene encoding UV damage endonuclease (UVDE). Altho
ugh uvde gene disruptant cells are only mildly UV sensitive, a double
disruptant of uvde and rad13 (a S.pombe mutant defective in NER) was s
ynergistically more sensitive than either single disruptant and was un
able to remove any photoproducts from cellular DNA. Analysis of the ki
netics of photoproduct removal in different mutants showed that the UV
DE-mediated pathway operates much more rapidly than NER. In contrast t
o a previous report, our genetic analysis showed that rad12 and uvde a
re not the same gene. Disruption of the rad2 gene encoding a structure
-specific flap endonuclease makes cells UV sensitive, but much of this
sensitivity is not observed if the uvde gene is also disrupted, Furth
er genetic and immunochemical analyses suggest that DNA incised by UVD
E is processed by two separate mechanisms, one dependent and one indep
endent of flap endonuclease.