The deposition of nitrogen-containing carbon films on silicon substrates at
atmospheric pressure and low temperature has been carried out by electroly
sis of methanol and ammonia solutions. Amorphous carbon films containing ab
out 8% nitrogen were obtained. The observed CN vibration bonds by Raman and
FTIR spectroscopy and the chemical states by XPS of C and N atoms indicate
that the carbon and nitrogen are sp(2) and sp(3) chemically bonded in the
films. Schemes for film growth in the liquid phase were suggested. (C) 1999
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