Co-Cr alloy films (20 at.% Cr) were deposited by DC planar magnetron sputte
ring under various conditions, e.g. film thickness, Ar working gas pressure
, deposition rate, substrate temperature, annealing temperature and negativ
e bias voltage. The structure of the films was analyzed systematically with
the X-ray diffraction technique. The preferred orientation of crystallites
(texture) was evaluated from the full width at half maximum of rocking cur
ve of HCP (0002) crystal planes, while the (0002) and (0004) diffraction li
ne profiles were interpreted by the analytic function method. The results s
how that the effective crystallite size (i.e. the coherent length in the fi
lm thickness direction) is normally in the range of 20-90 nm, and the micro
strain is about 3-12 x 10(-4). The increasing of bias voltage obviously mak
es the microstrain increase. In addition, the decreasing of the effective c
rystallite size corresponds to the degradation of the preferred c-axis orie
ntation for all conditions under consideration, suggesting that the existen
ce of structural defects (such as voids, stacking faults, Cr segregation, a
nd twinning etc.) interrupts the coherency along the film thickness directi
on and induces a random orientation of crystallites as well. (C) 1999 Elsev
ier Science S.A. All rights reserved.