Characterization of laser ablated silicon thin films

Using laser ablation, we deposited silicon layers consisting of clusters an d crystalline domains onto glass, quartz, aluminum, titanium, copper, singl e-crystal silicon and single-crystal potassium bromide substrates. The micr ostructure and the morphology of the films were characterized by use of opt ical microscopy, laser scanning microscopy, atomic force microscopy, transm ission electron microscopy, micro-Raman spectroscopy, X-ray photoelectron s pectroscopy and X-ray diffraction. The results indicated that the deposited material wets composed of microcrystalline droplets, typically 3.5 mu m in diameter, separated by amorphous-like regions. The droplets were composed of crystalline material at their centers and an outer halo of nanometer-siz e particles. (C) 1999 Elsevier Science S.A. All rights reserved.