Thermal characterization of anisotropic thin dielectric films using harmonic Joule heating

A technique for thermal characterization of anisotropic dielectric films is developed. The technique is applicable to a film which has thickness of th e order of 1 mu m and is on a substrate with high thermal conductivity. Met al lines with various widths are deposited on the film using standard IC fa brication processes and are subjected to harmonic Joule heating. Monitoring the resulting amplitude of temperature oscillations in the metal lines all ows the determination of the in-plane and out-of-plane thermal conductivity . The present work performs thermometry using the electrical method known a s the 3 omega technique and also the thermoreflectance technique. Measureme nt results are reported for polyimide films on silicon substrates. (C) 1999 Elsevier Science S.A. All rights reserved.