Growth by molecular beam epitaxy and characterization of CaF2 : Pr3+ planar waveguides

Citation
T. Balaji et al., Growth by molecular beam epitaxy and characterization of CaF2 : Pr3+ planar waveguides, THIN SOL FI, 339(1-2), 1999, pp. 187-193
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
339
Issue
1-2
Year of publication
1999
Pages
187 - 193
Database
ISI
SICI code
0040-6090(19990208)339:1-2<187:GBMBEA>2.0.ZU;2-3
Abstract
Pr3+-doped CaF2 layers on CaF2(111) substrates were grown by molecular beam epitaxy. The effect of Pr concentration on spectroscopic properties and wa veguide characteristics of the thin films was investigated and the existenc e of clustering of the tripositive praseodyme ions in CaF2 was put forward to explain certain optical results. Photoluminescence spectra were obtained in the wavelength range 590-650 nm for P-3(0) --> F-3(2) and (3)p(0), H-3( 6) transitions of pr(3+) ions, and a P-3(0) level lifetime of the order of 100 mu s was measured. This work demonstrates that active optical waveguide s, useful for integrated optoelectronic devices, can be produced by growing Pr-doped CaF2 epitaxiaI layers. (C) 1999 Elsevier Science S.A. All rights reserved.