Ti-49 at.% Ni thin films developed by magnetron sputtering were annealed un
der different conditions. Two types of precipitates, the FCC Ti2Ni and HCP
TiNi3, were found to exist simultaneously in the annealed films. Their size
, distribution and morphology can be strongly affected by the annealing con
ditions. The phase transformation behavior was recorded by a standard d.c.
method. The martensitic transformation temperatures of annealed films were
much lower than those reported for TiNi films, which may possibly be explai
ned by the small size of grains and precipitates, the close distance betwee
n precipitates and the orientation of some TiNi3 precipitates. With the int
ensification of annealing conditions, the martensitic transformation temper
ature was increased. The changed size and distribution of precipitates were
used to explain this tendency. (C) 1999 Elsevier Science S.A. All rights r
eserved.