Structure and microhardness of magnetron sputtered ZrCu and ZrCu-N films

The properties of ZrCu and ZrCu-N films magnetron sputtered from an alloyed ZrCu (70/30 wt.%) target in Ar and Ar + N-2 at the same total pressure of 0.7 Pa, respectively, are reported. Zr and Cu are immiscible elements in th is composition range resulting in characteristic film properties. A ZrCu fi lm sputter deposited on an unheated substrate was nanocrystalline and chara cterized by one very broad (about 8 degrees) X-ray reflection line; the sub strate temperature T-s up to about 500 degrees C did not affect the ZrCu na nocrystalline structure, but at T-s > 500 degrees C a recrystallization pro cess started with a polycrystalline ZrCu film being formed. Addition of nit rogen to the ZrCu film converted the nanocrystalline film to a nanocomposit e: and to separate clearly individual phases of this nanocomposite its subs trate needed heating. ZrCu-N films sputtered at T-s greater than or equal t o 500 degrees C were nanocomposites composed of Cu and ZrN. The microhardne ss of the ZrCu film was about 750 kg/mm(2) and that of the ZrCu-N film incr eased with increasing partial pressure of nitrogen but at greater than or e qual to 0.3 Pa N-2 it reached a maximum at a value of 2200 kg/mm(2). The mi crohardness of ZrCu-N films reactively sputtered at 0.3 Pa N-2 was almost c onstant up to T-s = 600 degrees C. (C) 1999 Elsevier Science Ltd. All right s reserved.