UV laser-induced photolysis of silacyclopent-3-ene: unseparable photochemistry of reactant and product for chemical vapour deposition of Si/C/H polymer

UV laser-induced photolysis of silacyclopent-3-ene in the gas phase is a cl ean extrusion of silylene yielding buta-1,3-diene. Silylene self-polymerisa tion and consequent deposition of SinH2n agglomerates is precluded by concu rrently occurring photolysis of buta-1,3-diene. The solid polymeric deposit being produced through polymerisation steps involving both H2Si: and the p roducts of the buta-1,3-diene photolysis makes the reaction suitable for ch emical vapour deposition of Si/C/H films. (C) 1999 Elsevier Science S.A. Al l rights reserved.