Deposition behavior in a low-temperature cascade arc torch (CAT) polymerization process

Authors
Citation
Qs. Yu et Hk. Yasuda, Deposition behavior in a low-temperature cascade arc torch (CAT) polymerization process, J POL SC PC, 37(7), 1999, pp. 967-982
Citations number
11
Categorie Soggetti
Organic Chemistry/Polymer Science
Journal title
JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY
ISSN journal
0887624X → ACNP
Volume
37
Issue
7
Year of publication
1999
Pages
967 - 982
Database
ISI
SICI code
0887-624X(19990401)37:7<967:DBIALC>2.0.ZU;2-U
Abstract
Two kinds of hydrocarbon type monomers and three kinds of organosilicons we re polymerized by a low-temperature cascade are argon plasma torch. Their d eposition behaviors were studied as a function of experimental parameters a nd monomer elemental compositions. It was found that the normalized deposit ion rate (DR), expressed as deposition yield of DR/(FM)(m), was determined by a composite operational parameter, W*(FM)(c)/(FM)(m), where W is the pow er input, and (FM)(c) and (FM)(m) are the mass flow rates of carrier gases and monomers, respectively. Experimental results indicated that the deposit ion yield is highly dependent on the elementary compositions of monomers. O ptical emission spectroscopy study on the argon plasma torch showed that th e emission intensity of excited argon neutrals was proportional to the valu e of the parameter W*(FM)(c). These results further certified that excited argon neutrals are the main energy carriers from the cascade are column to activate monomers in the argon plasma torch. (C) 1999 John Wiley & Sons, In c.