Particle generation in W-Ti deposition

This study reports the influence of sputter target density, microstructure and second phase precipitation on the particle performance in W 10 wt% Ti t arget sputtered thin films. By controlling the sintering process, a variety of W-Ti alloy sputtering target structures were prepared. These targets we re sputtered using a physical vapor deposition process. Observations of the sputtered target surfaces reveal that the brittle redeposited nodules gene rate in the low erosion zone and around voids in the target material. The n odules together with the precipitated tungsten in the Ti-rich phase are mos t likely the particle sources. (C) 1999 American Vacuum Society. [S0734-210 1(99)01402-5].