Processing of porous GaAs at low frequency sparking

Citation
A. Gudino-martinez et al., Processing of porous GaAs at low frequency sparking, J VAC SCI A, 17(2), 1999, pp. 624-629
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
17
Issue
2
Year of publication
1999
Pages
624 - 629
Database
ISI
SICI code
0734-2101(199903/04)17:2<624:POPGAL>2.0.ZU;2-2
Abstract
We report on the preparation of photoluminescent porous GaAs by the applica tion of high voltage spark discharges at low repetition rates (20 Hz) in ai r and in argon atmospheres. The spark-processed porous (spp) samples were c haracterized by the observation of their visible photoluminescence (PL) whe n illuminated with UV monochromatic radiation. In contrast to previous work on spp-GaAs at high sparking frequencies we find that the PL of samples pr epared at low sparking frequency is highly reproducible from sample to samp le. Important differences are observed in the initial PL spectra of the spp -GaAs according to the atmosphere of preparation under similar conditions. After prolonged air exposure both the spp-GaAs prepared in air and in argon show two similar broad peaks at energy positions 2.5 and 3.1 eV. Raman res ults indicate that the PL might not be associated to any size dependent mec hanism. We present evidence that oxygen compounds formed by the exposure to air of the samples play a role in the PL excited in the spp-GaAs. This is reinforced by x-ray photoelectronic spectroscopy measurements that indicate that the spp-GaAs is covered by an oxidized film. (C) 1999 American Vacuum Society. [S0734-2101(99)03002-X].