Structural confirmation of polyurethane dendritic wedges and dendrimers using post source decay matrix-assisted laser desorption/ionization time-of-flight mass spectrometry
U. Puapaiboon et al., Structural confirmation of polyurethane dendritic wedges and dendrimers using post source decay matrix-assisted laser desorption/ionization time-of-flight mass spectrometry, RAP C MASS, 13(6), 1999, pp. 516-520
'Post source decay' analysis was utilized in structural confirmation of fir
st, second and third generation polyurethane dendritic wedges as well as fi
rst generation porphyrin dendrimers. The samples were prepared by using alp
ha-cyano-4-hydroxycinnamic acid and acetone as the matrix and the solvent,
respectively. The cleavages take place at both inner and outer layers of th
e dendritic compounds. Sodium ion adducts from the cleavage at the ester or
amide bond (or a combination of both) are observed. The results obtained a
re in good agreement with the proposed structures of all analyzed compounds
. Copyright (C) 1999 John Wiley & Sons, Ltd.