High resolution x-ray diffractometry of the structural characteristics of a semiconducting (InGa)As/GaAs superlattice

Citation
Yi. Nesterets et al., High resolution x-ray diffractometry of the structural characteristics of a semiconducting (InGa)As/GaAs superlattice, TECH PHYS, 44(2), 1999, pp. 171-179
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
TECHNICAL PHYSICS
ISSN journal
10637842 → ACNP
Volume
44
Issue
2
Year of publication
1999
Pages
171 - 179
Database
ISI
SICI code
1063-7842(199902)44:2<171:HRXDOT>2.0.ZU;2-L
Abstract
A statistical approach is used to construct a kinematic theory of x-ray dif fraction on a semiconducting superlattice with a two layer period. This the ory takes two types of structural deformations into account: crystal lattic e defects caused by microdefects distributed chaotically over the thickness of the superlattice, and periodicity defects of an additional superlattice potential owing to random deviations in the thicknesses of the layers of i ts period from specified values. Numerical simulation is used to illustrate the effect of structural defects on the development of the diffraction ref lection curve. The theory is used to analyze experimental x-ray diffraction spectra of semiconducting InxGa1-xAs/GaAs superlattices. (C) 1999 American Institute of Physics. [S1063-7842(99)00902-2].