We deposited two different materials as a buffer layer for the growth of th
in RBa2Cu3O7-delta (RBCO) films R standing for Y or Dy: SrTiO3 and Yttria-S
tabilized-Zirconia (YSZ). Although highly (100)-oriented were obtained, the
SrTiO3 buffer layers onto Si did not allow the growth of high quality DBCO
films. On the contrary the YBCO films deposited on CeO2 / YSZ onto Si show
ed very good structural and electrical properties. Given these two examples
and the literature data, two parameters that may be critical for the succe
ssful epitaxial growth of oxide thin films on Si are pointed out.