A thin-film diamond phototransistor

Citation
Sp. Lansley et al., A thin-film diamond phototransistor, APPL PHYS L, 74(4), 1999, pp. 615-617
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
74
Issue
4
Year of publication
1999
Pages
615 - 617
Database
ISI
SICI code
0003-6951(19990125)74:4<615:ATDP>2.0.ZU;2-Y
Abstract
A phototransistor fabricated from thin-film diamond is reported. Polycrysta lline diamond grown by chemical vapor deposition, which is a-type by virtue of near-surface hydrogen, has been used to realize optically activated met al-semiconductor held-effect transistors (FETs). Devices with thin (30 nm) Al Schottky gates and Au source and drain contacts operate as effective enh ancement-mode metal-semiconductor field-effect transistors at room temperat ure; illumination of an electrically isolated gate leads to increased chann el current, although saturation is still evident. At deep UV wavelengths (< 220 nm), a photodetector gain of around 4 has been,measured; the mechanism of operation has been identified as photodiode-like turn-on followed by FET amplification. (C) 1999 American Institute of Physics. [S0003-6951(99)0290 2-2].