Stimulated emission characteristics of InGaN/GaN multiple quantum wells: Excitation length and excitation density dependence

Citation
Tj. Schmidt et al., Stimulated emission characteristics of InGaN/GaN multiple quantum wells: Excitation length and excitation density dependence, APPL PHYS L, 73(25), 1998, pp. 3689-3691
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
73
Issue
25
Year of publication
1998
Pages
3689 - 3691
Database
ISI
SICI code
0003-6951(199812)73:25<3689:SECOIM>2.0.ZU;2-N
Abstract
Optically pumped stimulated emission (SE) from InGaN/GaN multiple quantum w ells (MQWs) grown by metalorganic chemical vapor deposition has been system atically studied as a function of excitation length (L-exc). Two distinct S E peaks were observed from these structures: one that originates at 425 nm at 10 K (430 nm at 300 K) and another that originates at 433 nm at 10 K (43 8 nm at 300 K). The SE threshold for the high-energy peak was observed to a lways be lower than that of the low-energy peak, but the difference was fou nd to decrease greatly with increasing L-exc. A detailed study of the emiss ion intensity of these two SE peaks as a function of excitation density sho ws that the two peaks compete for gain in the MQW active region. (C) 1998 A merican Institute of Physics. [S0003-6951(98)00551-8].