Pressure and temperature dependence of the absorption edge of a thick Ga0.92In0.08As0.985N0.015 layer

Citation
P. Perlin et al., Pressure and temperature dependence of the absorption edge of a thick Ga0.92In0.08As0.985N0.015 layer, APPL PHYS L, 73(25), 1998, pp. 3703-3705
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
73
Issue
25
Year of publication
1998
Pages
3703 - 3705
Database
ISI
SICI code
0003-6951(199812)73:25<3703:PATDOT>2.0.ZU;2-J
Abstract
We have studied the pressure and temperature dependence of the absorption e dge of a 4-mu m-thick layer of the alloy Ga0.92In0.08As0.985N0.015. We have measured the hydrostatic pressure coefficient of the energy gap of this al loy to be 51 meV/GPa, which is more than a factor two lower than that of Ga As (116 meV/GPa). This surprisingly large lowering of the pressure coeffici ent is attributed to the addition of only similar to 1.5% nitrogen. In addi tion, the temperature-induced shift of the edge is reduced by the presence of nitrogen. We can explain this reduction by the substantial decrease of t he dilatation term in the temperature dependence of the energy gap. (C) 199 8 American Institute of Physics. [S0003-6951(98)01251-0].