MONOLITHIC INTEGRATION OF SEEDS AND VLSI GAAS CIRCUITS BY EPITAXY ON ELECTRONICS

Citation
H. Wang et al., MONOLITHIC INTEGRATION OF SEEDS AND VLSI GAAS CIRCUITS BY EPITAXY ON ELECTRONICS, IEEE photonics technology letters, 9(5), 1997, pp. 607-609
Citations number
12
Categorie Soggetti
Optics,"Physics, Applied
ISSN journal
10411135
Volume
9
Issue
5
Year of publication
1997
Pages
607 - 609
Database
ISI
SICI code
1041-1135(1997)9:5<607:MIOSAV>2.0.ZU;2-2
Abstract
Using the epitaxy-on electronics (EoE) process, self-electrooptic effe ct devices (SEED's) have been monolithically integrated with VLSI GaAs electronics., The EoE approach provides both depletion-mode and enhan cement-mode MESFET's for large-scale, high-density optoelectronic circ uits, The performance of SEED's grown by molecular beam epitaxy at a r educed temperature compatible with the EoE process is shown to be robu st, and modulators with contrast ratios of 2.3:1 at 7.5-V bias have be en integrated on commercially processed VLSI GaAs circuits, The EoE-SE ED process offers potential improvements over the FET-SEED process, fa cilitating the applications of SEED's in free-space optical switching and computing.