Transparent Si/SiOx nanocomposite films, spontaneously adsorbed on glass or
quartz substrates from their colloidal suspensions via a sonication-assist
ed oxidation process, are presently reported. Individual nanosilicon partic
les (ca. 20 nm) appear to cover a significant part of the substrate along w
ith agglomerates on the order of 50-80 nm in thickness. Kinetic studies ind
icate a rapid initial adsorption that slows down significantly after 3 h.