An error source in ellipsometry

Citation
R. Fondecave et al., An error source in ellipsometry, CR AC S IIB, 327(4), 1999, pp. 407-414
Citations number
6
Categorie Soggetti
Multidisciplinary
Journal title
COMPTES RENDUS DE L ACADEMIE DES SCIENCES SERIE II FASCICULE B-MECANIQUE PHYSIQUE ASTRONOMIE
ISSN journal
12874620 → ACNP
Volume
327
Issue
4
Year of publication
1999
Pages
407 - 414
Database
ISI
SICI code
1287-4620(199904)327:4<407:AESIE>2.0.ZU;2-S
Abstract
When measured by ellipsometry: the thickness of a polymer (PolyDiMethylSilo xane: PDMS) microscopic film deposited on a solid substrate (silicon wafer) is shown to depend upon the exposure time and the size of the light spot. We measured experimentally the thinning of such films. This effect can be a non-negligible source of error in the determination of microscopic liquid film thickness. To explain our results, we propose the existence of a Maran goni effect which is due to a local overheating produced by light absorptio n in the substrate. (C) Academie des sciences/Elsevier, Paris.