Molecular dynamics studies of thin film growth by ionized cluster beam deposition

Citation
K. Yorizane et Y. Yamamura, Molecular dynamics studies of thin film growth by ionized cluster beam deposition, COMP MAT SC, 14(1-4), 1999, pp. 241-247
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
COMPUTATIONAL MATERIALS SCIENCE
ISSN journal
09270256 → ACNP
Volume
14
Issue
1-4
Year of publication
1999
Pages
241 - 247
Database
ISI
SICI code
0927-0256(199902)14:1-4<241:MDSOTF>2.0.ZU;2-X
Abstract
The mechanism of thin-film growth by ionized cluster beam deposition (ICBD) has been investigated, using molecular dynamics (MD) simulations with the hybrid interatomic potentials which have been developed by combining the em bedded-atom-method (EAM) potentials with the screened Coulomb average modif ied Lenz-Jensen (AMLJ) potential. In order to clarify the conversion mechan ism of cluster energy into surface migration energy in ICED, we have invest igated the cluster impact phenomena for Cu-201 impact on Cu (1 1 1) and Pt (1 1 1) with a cluster energy of 5 eV/atom, For a Cu-201 impact on a Pt (1 1 1), a half of cluster atoms migrated on the substrate surface with relati vely high migration energies. On the other hand, for a Cu-201 impact on a C u(1 1 1), most of the cluster atoms are embedded into the substrate, and a small amount of them migrate with small migration energies. In the conversi on mechanism of cluster energy into surface migration energy in ICED, the m ost important point is whether the high-density zone is formed in the centr al part of the cluster, above or below the surface. (C) 1999 Elsevier Scien ce B.V. All rights reserved.