An intelligent supervisory system for ion implantation in IC fabrication processes

This pager presents a real-time intelligent supervision system for IC ion i mplantation processes. A hardware interface is developed, to extract the fe atures directly from the 2-D analog image signals of a beam map. A qualitat ive model for the beam scanning is then obtained, and the symptoms of abnor mal operations can be analyzed to achieve on-line diagnosis. Furthermore, a fuzzy expert system is developed to advise operators on making appropriate adjustments for the beam scanning. This supervisory system has been implem ented on Eaten NV-6200 A/AV ion implanters at the Taiwan Semiconductor Manu facturing Company. (C) 1999 Elsevier Science Ltd. All rights reserved.