Photoelectrodeposition of copper on boron-doped diamond films: applicationto conductive pattern formation on diamond. The photographic diamond surface phenomenon

Citation
S. Yoshihara et al., Photoelectrodeposition of copper on boron-doped diamond films: applicationto conductive pattern formation on diamond. The photographic diamond surface phenomenon, ELECTR ACT, 44(16), 1999, pp. 2711-2719
Citations number
17
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
ELECTROCHIMICA ACTA
ISSN journal
00134686 → ACNP
Volume
44
Issue
16
Year of publication
1999
Pages
2711 - 2719
Database
ISI
SICI code
0013-4686(1999)44:16<2711:POCOBD>2.0.ZU;2-S
Abstract
The photoelectrodeposition of copper on semiconducting B-doped diamond film s was investigated. There were clear morphology differences between photoel ectrodeposited and electrodeposited copper. Photoelectrodeposition proceede d by a uniform two-dimensional growth process, whereas electrodeposition in volved isolated random deposition. By applying this effect we have succeede d in forming a conductive copper pattern on semiconducting B-doped diamond with the aid of a photo-mask. Interestingly, it was further found that chan ges occurring on the diamond surface during photoelectrochemical polarizati on in the absence of copper in solution facilitate subsequent copper electr odeposition in the dark, possibly due to the formation of subsurface hydrog en. We refer to this as the 'photographic diamond surface phenomenon'. (C) 1999 Elsevier Science Ltd. All rights reserved.