Photoelectrodeposition of copper on boron-doped diamond films: applicationto conductive pattern formation on diamond. The photographic diamond surface phenomenon
S. Yoshihara et al., Photoelectrodeposition of copper on boron-doped diamond films: applicationto conductive pattern formation on diamond. The photographic diamond surface phenomenon, ELECTR ACT, 44(16), 1999, pp. 2711-2719
The photoelectrodeposition of copper on semiconducting B-doped diamond film
s was investigated. There were clear morphology differences between photoel
ectrodeposited and electrodeposited copper. Photoelectrodeposition proceede
d by a uniform two-dimensional growth process, whereas electrodeposition in
volved isolated random deposition. By applying this effect we have succeede
d in forming a conductive copper pattern on semiconducting B-doped diamond
with the aid of a photo-mask. Interestingly, it was further found that chan
ges occurring on the diamond surface during photoelectrochemical polarizati
on in the absence of copper in solution facilitate subsequent copper electr
odeposition in the dark, possibly due to the formation of subsurface hydrog
en. We refer to this as the 'photographic diamond surface phenomenon'. (C)
1999 Elsevier Science Ltd. All rights reserved.