Micropatterning of BiSrCaCuO thin films using excimer laser

Citation
S. Higo et al., Micropatterning of BiSrCaCuO thin films using excimer laser, INT J MOD B, 12(32), 1998, pp. 3485-3494
Citations number
26
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
INTERNATIONAL JOURNAL OF MODERN PHYSICS B
ISSN journal
02179792 → ACNP
Volume
12
Issue
32
Year of publication
1998
Pages
3485 - 3494
Database
ISI
SICI code
0217-9792(199812)12:32<3485:MOBTFU>2.0.ZU;2-W
Abstract
Micropatterning of BiSrCaCuO(BSCCO) superconducting thin films has been suc cessfully accomplished by using a pulsed KrF excimer laser with a wavelengt h of lambda = 248 nm and a duration of 25 ns. The optimum energy density of the laser was 0.36 Jcm(-2) for etching of these films. For example, a supe rconducting microstructure of BSCCO film with nominally 3 mu m wide and 2 m u m long, showed no degradation in T-c and J(c). Excimer laser patterning t echnique yields reproducible patterning without any degradation of supercon ducting properties. The etching bordering and surface morphology was examin ed using an atomic force microscope.