Generation and annealing characteristics of paramagnetic centers in oxidized 3C-SiC and 6H-SIC

Electron paramagnetic resonance studies show that defects are activated in oxidized 3C-SiC and 6H-SiC by heat-treatments at temperatures greater than 800 degrees C in dry (<1 ppm H2O) N-2 or O-2 ambients. Annealing in forming gas (7% H-2, 93% N-2) at 700 degrees C completely passivates the centers i nduced by the dry heat-treatment. By contrasting the generation and anneali ng kinetics for these centers with the well studied Si dangling bond, we su ggest that the centers in the oxidized SiC are C dangling bonds created by hydrogen effusion during the dry heat-treatment.