This paper focuses on the deposition of silicon oxide thin films, using las
er assisted CVD based on a CO2 laser, and on the feasibility of the process
for coating porous silicon samples. Scanning electron and atomic force mic
roscopy were used to analyse the morphology and microstructure of the films
, while structure and chemical composition were determined by Fourier trans
form infrared and Rutherford backscattering spectroscopy. Two-wavelength el
lipsometry was used for thickness and refractive index evaluation. The phot
oluminescence of SiO2/PS was measured and compared with that of uncoated sa
mples. (C) 1999 Elsevier Science B.V. All rights reserved.