Effect of oxygen implantation on ionoluminescence of porous silicon

Citation
J. Zuk et al., Effect of oxygen implantation on ionoluminescence of porous silicon, J LUMINESC, 80(1-4), 1998, pp. 187-192
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF LUMINESCENCE
ISSN journal
00222313 → ACNP
Volume
80
Issue
1-4
Year of publication
1998
Pages
187 - 192
Database
ISI
SICI code
0022-2313(199812)80:1-4<187:EOOIOI>2.0.ZU;2-7
Abstract
We report on ionoluminescence investigations of porous Si prepared from the p(+)-type Si, which exhibited, after prolonged ambient air exposure, moder ate photon emission with a maximum in the red-orange region. In an attempt to activate a shorter wavelength emission, the samples were implanted with 225 keV O+ ions at the dose of I x 10(17) cm(-2) The strong blue band at 2. 7 eV, well known in silica, has emerged in the ionoluminescence spectra fol lowing the oxygen implantation. The results of the comparative ionoluminesc ence experiments, performed on both porous Si and two forms of silica, show the important role of SiO2 defect-related states in ion-induced optical em ission from porous Si. (C) 1999 Elsevier Science B.V. All rights reserved.