1.54 mu m Emission of pulsed-laser deposited Er-doped films on Si

Citation
S. Lanzerstorfer et al., 1.54 mu m Emission of pulsed-laser deposited Er-doped films on Si, J LUMINESC, 80(1-4), 1998, pp. 353-356
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF LUMINESCENCE
ISSN journal
00222313 → ACNP
Volume
80
Issue
1-4
Year of publication
1998
Pages
353 - 356
Database
ISI
SICI code
0022-2313(199812)80:1-4<353:1MMEOP>2.0.ZU;2-U
Abstract
We investigate the photoluminescence properties of Er-doped SiO2 and glass films fabricated by pulsed-laser deposition (PLD) for different deposition parameters and erbium host materials. The luminescence yield of SiO2 :Er fi lms increases strongly with increasing oxygen background pressure during la ser ablation. We compare SiO2 and soda-lime glass as host materials for erb ium ions. Under identical growth conditions and the same erbium concentrati ons in both targets, films deposited from the soda-lime glass show a much h igher luminescence yield. This enhancement is attributed to a higher concen tration of optically active erbium in the multicomponent glass environment. (C) 1999 Elsevier Science B.V. All rights reserved.