We investigate the photoluminescence properties of Er-doped SiO2 and glass
films fabricated by pulsed-laser deposition (PLD) for different deposition
parameters and erbium host materials. The luminescence yield of SiO2 :Er fi
lms increases strongly with increasing oxygen background pressure during la
ser ablation. We compare SiO2 and soda-lime glass as host materials for erb
ium ions. Under identical growth conditions and the same erbium concentrati
ons in both targets, films deposited from the soda-lime glass show a much h
igher luminescence yield. This enhancement is attributed to a higher concen
tration of optically active erbium in the multicomponent glass environment.
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