On the origin of 1.5 mu m luminescence in porous silicon coated with sol-gel derived erbium-doped Fe2O3 films

Citation
Nv. Gaponenko et al., On the origin of 1.5 mu m luminescence in porous silicon coated with sol-gel derived erbium-doped Fe2O3 films, J LUMINESC, 80(1-4), 1998, pp. 399-403
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF LUMINESCENCE
ISSN journal
00222313 → ACNP
Volume
80
Issue
1-4
Year of publication
1998
Pages
399 - 403
Database
ISI
SICI code
0022-2313(199812)80:1-4<399:OTOO1M>2.0.ZU;2-5
Abstract
Sol-gel derived Fe2O3 films containing about 10 wt% of Er2O3 were deposited on porous silicon by dipping or by a spin-on technique followed by thermal processing at 1073 K for 15 min. The samples were characterized by means o f PL, SEM and X-ray diffraction analyses. They exhibit strong room-temperat ure luminescence at 1.5 mu m related to erbium in the sol-gel derived host. The luminescence intensity increases by a factor of 1000 when the samples are cooled from 300 to 4.2 K. After complete removal of the erbium-doped fi lm by etching and partial etching the porous silicon, the erbium-related lu minescence disappears. Following this, luminescence at 1.5 mu m originating from optically active dislocations ("D-lines") in porous silicon was detec ted. The influence of the conditions of synthesis on luminescence at 1.5 mu m is discussed. (C) 1999 Elsevier Science B.V. All rights reserved.