The influence of neon in the deposition of titanium nitride by plasma-assisted physical vapour deposition

Authors
Fancey, KS Leyland, A Badow, FM Matthews, A
Citation
Ks. Fancey et al., The influence of neon in the deposition of titanium nitride by plasma-assisted physical vapour deposition, MAT SCI E A, 262(1-2), 1999, pp. 227-231
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
ISSN journal
09215093 → ACNP
Volume
262
Issue
1-2
Year of publication
1999
Pages
227 - 231
Database
ISI
SICI code
0921-5093(19990401)262:1-2<227:TIONIT>2.0.ZU;2-R
Abstract
Titanium nitride coatings were produced by reactive (plasma-assisted) depos ition in argon and neon-based nitrogenous discharges. Coating analysis has indicated that during deposition, nitrogen reactivity can be enhanced when neon is used, and this may be attributed to Penning ionisation. The effect could assist deposition onto heat-sensitive materials by permitting lower p rocessing temperatures. (C) 1999 Elsevier Science S.A. All rights reserved.