Modified method of lines for open microstrip structures with finite metallization thickness and conductivity

Citation
Nn. Feng et al., Modified method of lines for open microstrip structures with finite metallization thickness and conductivity, MICROW OPT, 21(1), 1999, pp. 60-63
Citations number
10
Categorie Soggetti
Optics & Acoustics
Journal title
MICROWAVE AND OPTICAL TECHNOLOGY LETTERS
ISSN journal
08952477 → ACNP
Volume
21
Issue
1
Year of publication
1999
Pages
60 - 63
Database
ISI
SICI code
0895-2477(19990405)21:1<60:MMOLFO>2.0.ZU;2-6
Abstract
A modified method of lines (MMoL) is developed to analyze open microstrip s tructures with finite metallization thickness and conductivity. The integra tion along the normal of the interface between the conductor and dielectric is analytically integrated before the method of lines transform. The perio dic boundary conditions (PBC) are employed to simulate the open structure. Due to the uniform descretization which leads to the analytical form to eig envalues and the application of the fast Fourier transform (FFT) technique, our approach can reduce the computation time significantly. The comparison between our results and published theoretical or experimental ones shows t he accuracy and efficiency of this method. (C) 1999 John Wiley & Sons, Inc.