Upper limit to Landau damping in helicon discharges

Citation
Ff. Chen et Dd. Blackwell, Upper limit to Landau damping in helicon discharges, PHYS REV L, 82(13), 1999, pp. 2677-2680
Citations number
28
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW LETTERS
ISSN journal
00319007 → ACNP
Volume
82
Issue
13
Year of publication
1999
Pages
2677 - 2680
Database
ISI
SICI code
0031-9007(19990329)82:13<2677:ULTLDI>2.0.ZU;2-0
Abstract
The uncommonly high rf absorption efficiency of helicon discharges has been thought to be caused by Landau damping of helicon waves and the concomitan t acceleration of primary electrons. By constructing an energy analyzer tha t accounts for rf fluctuations in plasma potential, it is shown that Landau -accelerated electrons are too sparse to explain the ionization efficiency. Instead, rf absorption and ionization are found to be consistent with the mechanism of mode coupling to Trivelpiece-Gould modes at the plasma boundar y, [S0031-9007(99)08827-4].