Anisotropic step-flow growth and island growth of GaN(0001) by molecular beam epitaxy

Citation
Mh. Xie et al., Anisotropic step-flow growth and island growth of GaN(0001) by molecular beam epitaxy, PHYS REV L, 82(13), 1999, pp. 2749-2752
Citations number
15
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW LETTERS
ISSN journal
00319007 → ACNP
Volume
82
Issue
13
Year of publication
1999
Pages
2749 - 2752
Database
ISI
SICI code
0031-9007(19990329)82:13<2749:ASGAIG>2.0.ZU;2-F
Abstract
Anisotropic growth is observed for GaN(0001) during molecular beam epitaxy for both the step-flow growth mode and two-dimensional (2D) nucleation grow th mode. Using scanning tunneling microscopy, we find that in the step-flow growth mode, growth anisotropy strongly influences the shape of terrace ed ges, making them strikingly different between hexagonal and cubic films. In the 2D nucleation growth mode, anisotropic growth results in triangularly shaped islands. The importance of understanding growth anisotropy to achiev e better grown GaN films is discussed. [S0031-9007(99)08731-1].