Non-vacuum laser deposition of buffer layers for coated conductors

A pulsed TEA-CO2 laser in combination with the dynamic fluidized bed powder feeder was employed to deposit a thin CeO2 buffer layer on the polycrystal line Ni-substrate in a non-vacuum environment. Use of the 30 degrees powder jet inclination with respect to the laser beam axis along with the nano si ze precursor powder deposited a smooth layer on the entire surface of the s ubstrate. Both EDS and X-ray diffractometry analyses were employed to confi rm the stoichiometric nature of the deposited CeO2 buffer layer. (C) 1999 E lsevier Science S.A. All rights reserved.