Selective ultrathin gold deposition by organometallic chemical vapor deposition onto organic self-assembled monolayers (SAMs)

We demonstrate a selective deposition of ultrathin gold layers via OMCVD (o rganometallic chemical vapor deposition) onto self-assembled dithiols. Dith iols have been self-assembled to produce a thiolated surface. The gold laye r deposited from a gold precursor, present in the vapor around the sample, is bound to the exposed thiol groups. We demonstrate that it is possible to deposit gold only onto the areas where the binding thiol groups are locate d. and investigate the growth process with spontaneous desorption time-of-f light mass spectrometry Rutherford backscattering spectroscopy, atomic abso rption spectroscopy and atomic force microscopy. (C) 1999 Elsevier Science S.A. All rights reserved.